Effect of deposition parameters on the properties of hydrogenated amorphous silicon films prepared by photochemical vapour deposition
โ Scribed by Abhijit De; Swati Ray; A.K. Barua
- Publisher
- Elsevier Science
- Year
- 1990
- Weight
- 447 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0165-1633
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Thin silicon carbide (SiCI films were prepared by plasma enhanced chemical vapour deposition PECVDI. The structural properties of Sic films were investigated by IR, RBS, and ERD measurement techniques. The results showed that the films contain the typical features found in hydrogenated amorphous Sic
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