TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 ยฐC. The str
โฆ LIBER โฆ
Effect of annealing temperature on the structure and optical properties of sputtered TiO2 films
โ Scribed by Baoxing Zhao; Jicheng Zhou; Yu Chen; Yinqiao Peng
- Book ID
- 116608102
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 805 KB
- Volume
- 509
- Category
- Article
- ISSN
- 0925-8388
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