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Effects of annealing temperature and method on structural and optical properties of TiO2 films prepared by RF magnetron sputtering at room temperature

✍ Scribed by Dongsun Yoo; Ilgon Kim; Sangsoo Kim; Chang Hie Hahn; Changyu Lee; Seongjin Cho

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
211 KB
Volume
253
Category
Article
ISSN
0169-4332

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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 Β°C. The str