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Effect of annealing conditions on the formation of low-dose SIMOX structures implanted at 190 keV

✍ Scribed by Yan Tan; B. Johnson; Supapan Seraphin; Jun Jiao; M. J. Anc; L. P. Allen

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Evolution of microstructure during annea

✍ B. Johnson; Jun Sik Jeoung; P. Anderson; Supapan Seraphin 📂 Article 📅 2002 🏛 Springer US 🌐 English ⚖ 898 KB

Effect of implantation energy and dose o

✍ M. Tamura; K. Tokiguchi; H. Seki; M. Ishimaru; H. Mori 📂 Article 📅 2005 🏛 Springer 🌐 English ⚖ 588 KB

The effects of implantation dose and ann

✍ Pradip K. Dutta; Sorin Cristoloveanu 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 693 KB

Post-annealing sequence effects on the c

✍ J.H. Liang; W.W. Wan 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 195 KB

Effect ofin situphotoexcitation ofn-type

✍ M. Yu. Barabanenkov; A. V. Leonov; V. N. Mordkovich; N. M. Omel’yanovskaya 📂 Article 📅 1999 🏛 Springer 🌐 English ⚖ 74 KB

Dose-rate effects on the formation of ul

✍ Daniel F Downey; Carlton M Osburn; James J Cummings; Sonu Daryanani; Scott W Fal 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 884 KB