Evolution of microstructure during annealing of low-dose SIMOX wafers implanted at 65 keV

✍ Scribed by B. Johnson; Jun Sik Jeoung; P. Anderson; Supapan Seraphin

• Book ID: 110337670
• Publisher: Springer US
• Year: 2002
• Tongue: English
• Weight: 898 KB
• Volume: 13
• Category: Article
• ISSN: 0957-4522
• DOI: 10.1023/a:1015528226182