## Abstract In this paper, the effects of vacancies introduced by rapid thermal processing (RTP) on nucleation and growth of oxide precipitates in Czochralski (Cz) silicon are elucidated. Moreover, the nitrogen and vacancy enhancement roles in oxide precipitation are differentiated through designin
โฆ LIBER โฆ
Effect of annealing atmosphere on the recombination activity of copper precipitates formed by rapid thermal process in conventional and nitrogen-doped Czochralski silicon wafers
โ Scribed by Wang, Weiyan; Yang, Deren; Ma, Xiangyang; Zeng, Yuheng; Que, Duanlin
- Book ID
- 120184945
- Publisher
- American Institute of Physics
- Year
- 2008
- Tongue
- English
- Weight
- 642 KB
- Volume
- 103
- Category
- Article
- ISSN
- 0021-8979
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The effect of rapid thermal process (RTP) on the oxygen precipitation and on the denuded zone (DZ) formation in nitrogen-doped Czochralski (NCZ) silicon wafers has been investigated. The DZ can be formed at the surface of NCZ wafers subjected to RTP annealing. However, the oxygen precipitation and b