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Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate

✍ Scribed by Zefang Zhang; Weili Liu; Zhitang Song

Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
803 KB
Volume
87
Category
Article
ISSN
0167-9317

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The effects of polishing pressure and abrasive on the chemical mechanical polishing of blanket and patterned aluminum thin films were investigated. The CMP process experiments were conducted using a soft pad and slurry mainly composed of acid solution and Al O abrasive. The result of the blanket fil