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EELS and NEXAFS structural investigations on the effects of the nitrogen incorporation in a-CNx films deposited by r.f. magnetron sputtering

✍ Scribed by Mubumbila, N.; Bouchet-Fabre, B.; Godon, C.; Marhic, C.; Angleraud, B.; Tessier, P-Y.; Minea, T.

No coin nor oath required. For personal study only.

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