Dry etch processes for optoelectronic de
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Roy Szweda
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Article
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2001
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Elsevier Science
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English
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In Issue 5, 2ooo we looked at the technical and business trends in etch processes for manufacturing gallium arsenide electronic devices. Here we turn to the application of dry etching to fabrication of optoelectronic devices -a much broader area (covering GaAs, lnP as well as GaN and II-Vl materials