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Dry-etching processes for high-temperature superconductors

โœ Scribed by L. Alff; G.M. Fischer; R. Gross; F. Kober; A. Beck; K.D. Husemann; T. Nissel; F. Schmidl; C. Burckhardt


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
908 KB
Volume
200
Category
Article
ISSN
0921-4534

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โœ Roy Szweda ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 584 KB

In Issue 5, 2ooo we looked at the technical and business trends in etch processes for manufacturing gallium arsenide electronic devices. Here we turn to the application of dry etching to fabrication of optoelectronic devices -a much broader area (covering GaAs, lnP as well as GaN and II-Vl materials