This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides
Dry Etching for VLSI
β Scribed by A.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader
- Publisher
- Springer
- Year
- 1991
- Tongue
- English
- Leaves
- 260
- Edition
- 1
- Category
- Library
No coin nor oath required. For personal study only.
β¦ Synopsis
This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing.
β¦ Subjects
ΠΡΠΈΠ±ΠΎΡΠΎΡΡΡΠΎΠ΅Π½ΠΈΠ΅;ΠΠΎΠ»ΡΠΏΡΠΎΠ²ΠΎΠ΄Π½ΠΈΠΊΠΎΠ²ΡΠ΅ ΠΏΡΠΈΠ±ΠΎΡΡ;
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