The influence of doping with acceptor atoms boron and aluminum and donor atoms nitrogen and phosphorus on silicon clusters as a model for semiconductors is investigated by semiempirical calculations with the MO method SINDO 1. The series XSi.,, XSi16, XS& and XSi3, is compared for X =Si, B, Al, N, P
Doping of saturated silicon clusters
β Scribed by Matthias Krack; Thomas Bredow; Karl Jug
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 368 KB
- Volume
- 237
- Category
- Article
- ISSN
- 0009-2614
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β¦ Synopsis
The effect of the doping of silicon is studied with model clusters YSi4Xl2 and YSi34X36 for Y = Si, B, N, AI and P and pseudoatoms X which serve to saturate the structures. SINDO1 calculations are performed at the ROHF level. From the trend for the valence of the central atom Y for the cationic, neutral and anionic systems acceptors and donors can be identified. The MO diagrams show acceptor and donor levels. The results are in agreement with the notion that boron and aluminum are acceptors and nitrogen and phosphorus are donors. However, the donor property of nitrogen is not pronounced in the band structure.
π SIMILAR VOLUMES
Using full-muffin-tin-orbital molecular-dynamics (FP-LMTO-MD) method, we have investigated the effect of aluminum heteroatoms on the geometric structures and bond characteristics of Si n (n ΒΌ 5-10) clusters in detail. It is found that the geometric framework of the ground state structures for Si n (
Boron-and silicon-doped carbon clusters of the type BmC . (m = 1-4) and Si,,C, (m = 1, 2) have been produced via the laser-vaporization cluster beam technique. The observed features of the intensity distribution in mass spectra suggest that B atoms can be incorporated into the clusters with much hig