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DLTS and EPR study of defects in H implanted silicon

✍ Scribed by V Mikšić; B Pivac; B Rakvin; H Zorc; F Corni; R Tonini; G Ottaviani


Book ID
114165203
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
273 KB
Volume
186
Category
Article
ISSN
0168-583X

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Annealing studies of cluster defects in
✍ M.A. Gad; J.H. Evans-Freeman 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 166 KB

High resolution Laplace deep level transient spectroscopy (LDLTS) has been applied to investigate the annealing behaviour of small cluster defects in n-type Si. The Si was implanted with either Ge or Si, with energies 1500 keV and 850 keV respectively, and doses of 1 • 10 10 cm À2 . The low dose ens