High resolution Laplace deep level transient spectroscopy (LDLTS) has been applied to investigate the annealing behaviour of small cluster defects in n-type Si. The Si was implanted with either Ge or Si, with energies 1500 keV and 850 keV respectively, and doses of 1 โข 10 10 cm ร2 . The low dose ens
High-resolution DLTS studies of vacancy-related defects in irradiated and in ion-implanted n-type silicon
โ Scribed by J.H Evans-Freeman; A.R Peaker; I.D Hawkins; P.Y.Y Kan; J Terry; L Rubaldo; M Ahmed; S Watts; L Dobaczewski
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 129 KB
- Volume
- 3
- Category
- Article
- ISSN
- 1369-8001
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