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Dissociation fraction in low-pressure inductively coupled N2–Ar and O2–Ar plasmas

✍ Scribed by Young Wook Lee; Hye-lan Lee; T.H. Chung

Book ID: 113514028
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 465 KB
Volume: 11
Category: Article
ISSN: 1567-1739
DOI: 10.1016/j.cap.2011.03.037

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