## Abstract The introduction of Si burst during the growth of GaN film on Si(111) substrate by MOCVD formed a Si__~x~__ N__~y~__ layer which leads to an effective reduction in the density of screw dislocations. The reduction is associated with bending of screw dislocations to form a square dislocat
β¦ LIBER β¦
Dislocation annihilation by silicon delta-doping in GaN epitaxy on Si
β Scribed by Contreras, O.; Ponce, F. A.; Christen, J.; Dadgar, A.; Krost, A.
- Book ID
- 120312636
- Publisher
- American Institute of Physics
- Year
- 2002
- Tongue
- English
- Weight
- 578 KB
- Volume
- 81
- Category
- Article
- ISSN
- 0003-6951
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