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Direct current diode sputtering: a study of the thermal power dissipated in the substrate

✍ Scribed by D Mahéo; J-M Poitevin

Book ID
103477094
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
459 KB
Volume
44
Category
Article
ISSN
0042-207X

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Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size
✍ Kah-Yoong Chan; Bee-San Teo 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 117 KB

This paper discusses the influence of direct current (DC) power in the magnetron sputtering process on the crystallite size of the copper (Cu) thin films deposited on p-type silicon substrate at room temperature. X-ray diffraction (XRD) and Karl Suss four-point probe were employed to study the film