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Influence of process parameters on the substrate heating in direct current plasma magnetron sputtering deposition process

✍ Scribed by Krishnasamy, Jegenathan; Chan, Kah-Yoong; Tou, Teck-Yong

Book ID: 115492133
Publisher: Emerald Group Publishing Limited
Year: 2010
Tongue: English
Weight: 132 KB
Volume: 27
Category: Article
ISSN: 1356-5362
DOI: 10.1108/13565361011034740

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