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Diffusion–drift–aggregation model of the interaction of point defects and dislocations in semiconductors

✍ Scribed by H. S. Leipner; H. Lei


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
218 KB
Volume
2
Category
Article
ISSN
1862-6351

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We demonstrate that strained GeSi/Si heterostructures act as a model system for the study of the interaction of propagating dislocations with point, line and planar defects. In such heterostructures, the effective stress acting on a propagating dislocation may be varied from tens of MPa to of order