𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Diffusion of impurities in undercooled melt of pulse heated ion-implanted silicon

✍ Scribed by Dvurechenskii, A. V. ;Grötzschel, R. ;Igonina, N. M. ;Koval, B. A. ;Lebbdeva, N. I.

Publisher
John Wiley and Sons
Year
1984
Tongue
English
Weight
470 KB
Volume
84
Category
Article
ISSN
0031-8965

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Diffusion of ion-implanted boron impurit
Diffusion of ion-implanted boron impurities into pre-amorphized silicon
✍ Naotsugu Ohno; Tohru Hara; Yasuhiko Matsunaga; Michael I Current; Morio Inoue 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 246 KB

Boron ion implantation into pre-amorphized silicon is studied. Pre-amorphization is performed either by F + or Si + implantation prior to B + implantation at 10 keV with 3 Â 10 15 ions/cm 2 . Broadening of the boron profile can be suppressed markedly in the pre-amorphized layers. For instance, the a