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Differential sheet resistivity of mixed implanted (phosphorus + boron) silicon

โœ Scribed by Anil Kumar; G.S. Virdi; P.J. George; S.K. Chattopadhyaya; N. Nath


Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
415 KB
Volume
29
Category
Article
ISSN
0026-2692

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The objective of this chapter is to address the electrical characterization of silicon implanted layer. The determination of the electrical activity profiles, in terms of free carriers concentration and mobility, is described using spreading resistance and stripping Hall effect techniques. Several r