✦ LIBER ✦

Dielectric breakdown characteristics and interface trapping of hafnium oxide films

✍ Scribed by N. Zhan; M.C. Poon; Hei Wong; K.L. Ng; C.W. Kok

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Electronic current and breakdown charact

✍ R.K. Nigam; K.C. Kalra; Parveen Katyal 📂 Article 📅 1988 🏛 Elsevier Science ⚖ 636 KB

Dielectric and interface properties of p

✍ Duffy, M. T. ;Carnes, J. E. ;Richman, D. 📂 Article 📅 1971 🏛 Springer-Verlag ⚖ 810 KB

Study of electrical and microstructure p

✍ R. K. Nahar; Vikram Singh; Aparna Sharma 📂 Article 📅 2007 🏛 Springer US 🌐 English ⚖ 263 KB

N and P metal oxide semiconductor field

✍ Veena Misra; Manoj Kulkarni; Huicai Zhong 📂 Article 📅 2001 🏛 Springer US 🌐 English ⚖ 350 KB

Time dependent dielectric breakdown (TDD

✍ Hsu, H.W.; Huang, H.S.; Chen, H.W.; Cheng, C.P.; Lin, K.C.; Chen, S.Y.; Wang, M. 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 541 KB

Temperature and electric field character

✍ Chi-Hung Lin; Cable, J.; Woo, C.S. 📂 Article 📅 1995 🏛 IEEE 🌐 English ⚖ 421 KB