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Development of advanced silylation process for 157-nm lithography

✍ Scribed by Isao Satou; Manabu Watanabe; Hiroyuki Watanabe; Toshiro Itani

No coin nor oath required. For personal study only.

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High sensitive negative silylation proce

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Metrology of pulsed radiation for 157-nm

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Resist process development for sub-100-n

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Absorbance and outgasing of photoresist

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