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Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF)

✍ Scribed by V. Penka; W. Hub


Book ID
112376631
Publisher
Springer
Year
1989
Tongue
English
Weight
396 KB
Volume
333
Category
Article
ISSN
1618-2650

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Total reΓ‘ection x-ray photoelectron spectroscopy (TRXPS) has been applied to measure contamination elements on Si wafers using an x-ray photoelectron spectrometer. The radiated x-rays are limited by a slit placed in front of the Al anode, and the grazing angle is made shallow by using a crystal to m