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Design of accelerators for ion implantation

✍ Scribed by Bjorn O. Pedersen


Book ID
114168223
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
725 KB
Volume
24-25
Category
Article
ISSN
0168-583X

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Ion implantation is of great importance in semiconductor device fabrication. Owing to the increasing interest of" the microelectronic industry in the implantation of ions in the megaelectronvolt energy range, high energy beams are required. Furthermore, for several applications the implanted dose is