✦ LIBER ✦

Depth-profiling analysis of polyimide films on copper substrates

✍ Scribed by H. Ishida; K. Kelley

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 413 KB
Volume: 32
Category: Article
ISSN: 0032-3861
DOI: 10.1016/0032-3861(91)90392-v

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Application of factor analysis in electr

Application of factor analysis in electron spectroscopic depth profiling on copper oxide

✍ Henning Bubert; Monika Korte; Rainer P.H. Garten; Erhard Grallath; Marek Wieluns 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 951 KB

Depth profiles were taken by x-ray photoelectron spectrometry/Ar-ion sputtering from copper sheets oxidized during 30 min in air at 200 or 3OO"C, respectively. The data of the depth profiles were subjected to factor analysis in order to determine the relevant components of the copper oxide layers. F

Fourier transform ir reflection techniqu

Fourier transform ir reflection techniques for characterization of polyimide films on copper substrates

✍ Kristen Kelley; Yuichi Ishino; Hatsuo Ishida 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 567 KB

Damage-depth profiling of ion-irradiated

Damage-depth profiling of ion-irradiated polyimide films with a variable-energy positron beam

✍ G. Dlubek; F. Börner; R. Buchhold; K. Sahre; R. Krause-Rehberg; K.-J. Eichhorn 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 158 KB 👁 2 views

Influence of argon pressure on the depth

Influence of argon pressure on the depth resolution during GDOES depth profiling analysis of thin films

✍ Shimizu, K.; Habazaki, H.; Skeldon, P.; Thompson, G. E.; Wood, G. C. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 142 KB 👁 2 views

The influence of Ar pressure on depth resolution during glow discharge optical emission spectroscopy (GDOES) depth profiling has been examined through the use of 358 nm thick anodic alumina films grown over flat aluminium surfaces. The films are ideal standards for the present purpose, being amorpho

Selective seeding of copper films on pol

Selective seeding of copper films on polyimide-patterned silicon substrate, using ion implantation

✍ S. Bhansali; D.K. Sood 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 526 KB

GDOES depth profiling analysis of a thin

GDOES depth profiling analysis of a thin surface film on aluminium

✍ Shimizu, K.; Habazaki, H.; Skeldon, P.; Thompson, G. E.; Wood, G. C. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 170 KB 👁 2 views

Analysis of a surface film ~4 nm thick formed on electropolished, high-purity aluminium given a postelectropolishing treatment in a hot CrO 3 -H 3 PO 4 solution demonstrates the suitability of glow discharge optical emission spectroscopy for in-depth analysis of very thin films. Thus, the distributi