𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Depth profiles of shallow implanted layers by soft ion sputtering and total-reflection X-ray fluorescence

✍ Scribed by H. Krzyżanowska; A. von Bohlen; R. Klockenkämper


Book ID
108261482
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
137 KB
Volume
58
Category
Article
ISSN
0584-8547

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Comparison of shallow depth profiles of
✍ Klockenkämper, R.; von Bohlen, A.; Becker, H. W.; Palmetshofer, L. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 94 KB 👁 2 views

Thin and shallow layers of some 50-150 nm were produced by ion implantation of Co ions in Si wafers and afterwards characterized by concentration-depth profiling. Two methods were applied for that purpose: a novel method combining a stepwise wet-chemical etching of an implanted wafer with total refl