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Analysis of the depth profile of Fe-Si buried layers in Fe+-implanted Si wafer by soft X-ray emission spectroscopy

✍ Scribed by V.R. Galakhov; E.Z. Kurmaev; S.N. Shamin; L.V. Elokhina; Yu.M. Yarmoshenko; A.A. Bukharaev

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
401 KB
Volume
72
Category
Article
ISSN
0169-4332

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