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Nondestructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass spectrometry

✍ Scribed by G. Pepponi; C. Streli; P. Wobrauschek; N. Zoeger; K. Luening; P. Pianetta; D. Giubertoni; M. Barozzi; M. Bersani


Book ID
108261510
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
428 KB
Volume
59
Category
Article
ISSN
0584-8547

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