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Depth profiling of Co/Ti – silicide films using total reflection X-ray fluorescence (TXRF) spectrometry combined with low energy ion beam etching (IBE) for sample preparation

✍ Scribed by W. Frank; A. Schindler; H.-J. Thomas


Book ID
105897305
Publisher
Springer
Year
1998
Tongue
English
Weight
81 KB
Volume
361
Category
Article
ISSN
1618-2650

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