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Deposition rates of high power impulse magnetron sputtering: Physics and economics

✍ Scribed by Anders, André

Book ID
121752158
Publisher
AVS (American Vacuum Society)
Year
2010
Tongue
English
Weight
462 KB
Volume
28
Category
Article
ISSN
0734-2101

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Physics of plasma-based ion implantation
Physics of plasma-based ion implantation & deposition (PBIID) and high power impulse magnetron sputtering (HIPIMS): A comparison
✍ Anders, André 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 431 KB

## Abstract The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma‐Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma‐sheath sys