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Deposition of Thin Films of SiOxCyH in a Surfatron Microwave Plasma Reactor with Hexamethyldisiloxane as Precursor

✍ Scribed by A. Walkiewicz-Pietrzykowska; J. Cotrino; A. R. González-Elipe


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
415 KB
Volume
11
Category
Article
ISSN
0948-1907

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