𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Deposition of microcrystalline silicon in electron-cyclotron resonance discharge (24GHz) plasma from silicon tetrafluoride precursor

✍ Scribed by Mansfeld, D.А.; Vodopyanov, А.V.; Golubev, S.V.; Sennikov, P.G.; Mochalov, L.A.; Andreev, B.А.; Drozdov, Yu N.; Drozdov, М.N.; Shashkin, V.I.; Bulkin, P.; Roca i Cabarrocas, P.


Book ID
121670265
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
416 KB
Volume
562
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Effect of ion energy on structural and e
✍ Ram, Sanjay K. ;Kroely, Laurent ;Bulkin, Pavel ;Cabarrocas, Pere Roca i 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 483 KB

## Abstract Microcrystalline silicon films were deposited in a matrix distributed electron cyclotron resonance (MDECR) plasma enhanced chemical vapor deposition (PECVD) system using pure silane, under varying substrate bias conditions. Microstructural characterization of the films shows a lower voi