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Deposition of magnetite films by reactive sputtering of iron

✍ Scribed by Heller, J.


Book ID
117922819
Publisher
IEEE
Year
1976
Tongue
English
Weight
528 KB
Volume
12
Category
Article
ISSN
0018-9464

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Characterization of NiO thin films depos
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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper