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Deposition of high quality CMR thin films by rf magnetron sputtering under pure argon gas

โœ Scribed by W.H Tang; T.L Kam; J Gao

Book ID
114065809
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
400 KB
Volume
36
Category
Article
ISSN
0025-5408

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Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering
โœ PK Petrov; VA Volpyas; EK Hollmann; T Tanaka; K Kawabata ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 205 KB

## RFpower and DC bias have been simultaneously applied to the target in a conventional magnetron sputtering system in order to control the growth kinetics of W thin films using argon gas for sputtering. A Monte Carlo simulation based on physical models of ion-plasma sputtering was carried out to st