Structural effect on UV emission properties of high-quality ZnO thin films deposited by RF magnetron sputtering
β Scribed by P.T. Hsieh; Y.C. Chen; K.S. Kao; C.M. Wang
- Book ID
- 108239569
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 171 KB
- Volume
- 392
- Category
- Article
- ISSN
- 0921-4526
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## Abstract Influences of O~2~/Ar flux ratio (__R__) on surface morphology and structural evolution have been studied in the case of ZnO films deposited on glass substrates by radioβfrequency (rf) magnetron sputtering. Results of atomic force microscopy (AFM), Xβray diffraction, and Xβray photoelec
ZnO thin films were deposited on corning glass substrates by RF magnetron sputtering at room temperature. The dependence of crystal structure, morphology and optical properties on postdeposition annealing was investigated using XRD, AFM and UV-vis Spectrophotometer. The asdeposited films were amorph