๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Deposition of hard coatings by a hollow-cathode arc evaporation device

โœ Scribed by A. Lunk

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
256 KB
Volume
140
Category
Article
ISSN
0921-5093

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Plasma Diagnostics in a Hollow Cathode a
Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX-Deposition
โœ A. Lunk; R. Basner ๐Ÿ“‚ Article ๐Ÿ“… 1990 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 470 KB

During the deposition of hard titaniumnitrid films the plasma conditions mere investigated with s movable Langmuir-probe in axial and radial directions systematically. The deposition took place in a hollow cathode arc evaporation equipment (HCAE). We measured the electron energy distribution functio

Influence of hollow cathode plasma on Al
Influence of hollow cathode plasma on AlCrN-thin film deposition with vacuum arc evaporation sources
โœ M. Holzherr; M. Falz; T. Schmidt ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 795 KB

In order to provide sufficient wear protection on tools, which supports to increase productivity in the manufacturing processes, the substrates can be coated with different hard material layers. High hardness is one important thin film property to get an optimal wear protection of tools, but if the