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Deposition of fluorine doped indium oxide by atmospheric pressure chemical vapour deposition

✍ Scribed by David W. Sheel; Jeffrey M. Gaskell

Book ID: 113937025
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 968 KB
Volume: 520
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.04.206

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