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Deposition of Diamondlike Carbon Film and Mass Spectrometry Measurement in CH4/N2 RF Plasma

โœ Scribed by Nobuki Mutsukura


Book ID
110246831
Publisher
Springer
Year
2001
Tongue
English
Weight
176 KB
Volume
21
Category
Article
ISSN
0272-4324

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To investigate processes occurring during thin-film deposition by plasma chemical vapor deposition, a study was made of the radical species in an RF CHdH\* plasma using photoionization mass spectrometry. The method avoids fragmentation of particles as can occur in conventional mass spectrometry by u