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Deposition of hydrogenated amorphous CNx film in CH4/N2 RF discharge

✍ Scribed by Mutsukura, Nobuki; Akita, Ken-ichi

Book ID
123061852
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
216 KB
Volume
8
Category
Article
ISSN
0925-9635

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Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis
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## analysis (chemical) The chemical composition and bond structure of polymer like amorphous hydrogenated carbon nitride (aH-CN x ) thin films was studied by solid-state 13 C and 1 H MAS NMR spectroscopy, FTIR spectroscopy and elemental analysis. The hydrogenated CN x film was deposited on Si (100