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Deposition of Diamond-Like Carbon Film and Mass Spectrometry Measurement in CH4/O2RF Plasma

✍ Scribed by Ken-ichi Tanaka; Nobuki Mutsukura

Book ID: 110410327
Publisher: Springer
Year: 1999
Tongue: English
Weight: 456 KB
Volume: 19
Category: Article
ISSN: 0272-4324
DOI: 10.1023/a:1021691625129

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## Abstract Plasma enhanced chemical vapour deposition technique (PECVD) was used to grow diamond‐like carbon films using pure methane gas plasma. Structural, optical and mechanical properties of the obtained a‐C:H films were investigated as a function of bias voltage in the range 120–270 V, using