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Deposition mechanisms and properties of oxygenated carbon nitride films from rf discharges of acetylene, nitrogen, oxygen and argon mixtures

✍ Scribed by Jianjun Wang; Steven F. Durrant; Mário A.B. de Moraes

Book ID: 117150198
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 282 KB
Volume: 262
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(99)00663-8

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