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Mechanisms of polymer film deposition from r.f. discharges of acetylene, nitrogen and helium mixtures

✍ Scribed by Steven F. Durrant; Nei Marçal; Sandra G. Castro; Rita C.G. Vinhas; Mário A.Bica De Moraes; Jorge H. Nicola

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
774 KB
Volume
259
Category
Article
ISSN
0040-6090

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✍ Nilson C. Da Cruz; Steven F. Durrant; Mário A. Bica De Moraes 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 187 KB 👁 2 views

Films were produced by plasma enhanced chemical vapor deposition (PECVD) of tetramethylsilane (TMS) -helium-argon mixtures with either oxygen or nitrogen in a vacuum system fed with radiofrequency power. Actinometric optical emission spectroscopy was used to determine trends in the concentrations of