Structure and mechanical properties of nickel/carbon nanocomposite films formed by microwave plasma-assisted deposition technique from argon–acetylene gas mixture
✍ Scribed by Y. Pauleau; V.V. Uglov; A.K. Kuleshov; M.V. Astashynskaya; M.P. Samtsov; S.N. Dub
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 673 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0257-8972
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✦ Synopsis
The structure and mechanical properties of nickel/hydrogenated amorphous carbon (Ni/a-C:H) films formed by microwave plasma-assisted deposition technique were investigated as a function of the carbon content using various methods: Rutherford backscattering spectroscopy (RBS), Raman spectroscopy and tribometry. The size of carbon clusters determined by Raman spectroscopy in Ni/a-C:H films deposited in gas mixtures containing 40 and 60% of C 2 H 2 , and in nickel free a-C:H films was 1 and 4 nm, respectively. However, the amorphous Ni/a-C:H films deposited from a gas mixture containing 60% of C 2 H 2 exhibited the lowest friction coefficient (∼ 0.04), at the same time the nanohardness of these films was ∼ 7 GPa.