Plasma polymer deposition from mixture of tetramethoxysilane and oxygen on PET films and their oxygen gas barrier properties

✍ Scribed by N. Inagaki; S. Tasaka; M. Makino

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 197 KB
• Volume: 64
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/(sici)1097-4628(19970509)64:6<1031::aid-app1>3.0.co;2-m

✦ Synopsis

Plasma polymerization of silane compounds has been discussed for deposition of SiOx positron emission tomography (PET) films at room temperature. A mixture of tetramethoxysilane (TMOS) and oxygen containing 60 mol % O 2 is a preferable raw material for SiOx formation by plasma polymerization. The deposited plasma polymers consist mainly of Si{O networks with small amount of Si{OH and Si{C groups. A part of Si{O networks in the plasma polymers is distorted by the Si{OH and Si{C groups. The oxygen permeability coefficient for the plasma polymer itself is 2.1 1 10 015 (STP) cm 3 /cm/cm 2 /s/cm Hg, which is lower that that for hydrolyzed ethylene-vinylacetate copolymer (Eval) and poly(vinylidene chloride) (Saran). Conclusively, the plasma polymer deposited from the mixture of TMOS and oxygen containing 60 mol % O 2 is a material with good oxygen barrier properties.