Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen
โ Scribed by N. Inagaki; V. Cech; K. Narushima; Y. Takechi
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 494 KB
- Volume
- 104
- Category
- Article
- ISSN
- 0021-8995
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๐ SIMILAR VOLUMES
Plasma polymerization of silane compounds has been discussed for deposition of SiOx positron emission tomography (PET) films at room temperature. A mixture of tetramethoxysilane (TMOS) and oxygen containing 60 mol % O 2 is a preferable raw material for SiOx formation by plasma polymerization. The de
To prepare silicon oxide (SiOx)-deposited poly(ethylene terephthalate) films with high oxygen gas barrier capability, SiOx deposition by plasma polymerization has been investigated from the viewpoint of chemical composition. Tetramethoxysilane (TMOS) is suitable as a starting material for the synthe