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Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen

โœ Scribed by N. Inagaki; V. Cech; K. Narushima; Y. Takechi


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
494 KB
Volume
104
Category
Article
ISSN
0021-8995

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Plasma polymer deposition from mixture o
โœ N. Inagaki; S. Tasaka; M. Makino ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 197 KB ๐Ÿ‘ 2 views

Plasma polymerization of silane compounds has been discussed for deposition of SiOx positron emission tomography (PET) films at room temperature. A mixture of tetramethoxysilane (TMOS) and oxygen containing 60 mol % O 2 is a preferable raw material for SiOx formation by plasma polymerization. The de

Preparation of oxygen gas barrier poly(e
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To prepare silicon oxide (SiOx)-deposited poly(ethylene terephthalate) films with high oxygen gas barrier capability, SiOx deposition by plasma polymerization has been investigated from the viewpoint of chemical composition. Tetramethoxysilane (TMOS) is suitable as a starting material for the synthe