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Deposition by reactive ion-plasma sputtering and characterization of CN thin films

✍ Scribed by Novikov, N.V.; Voronkin, M.A.; Smekhnov, A.A.; Zaika, N.I.; Zakharchuk, A.P.

Book ID
123242041
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
410 KB
Volume
4
Category
Article
ISSN
0925-9635

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper