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Deposition and characterization of molybdenum thin films using dc-plasma magnetron sputtering

✍ Scribed by Khan, Majid; Islam, Mohammad

Book ID
121592334
Publisher
Springer
Year
2013
Tongue
English
Weight
911 KB
Volume
47
Category
Article
ISSN
1063-7826

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## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had