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Depletion Effects of Silicon Carbide Deposition from Methyltrichlorosilane

✍ Scribed by Theodore M. Besmann; Brian W. Sheldon; Thomas S. Moss III; Michael D. Kaster

Book ID
110825890
Publisher
John Wiley and Sons
Year
1992
Tongue
English
Weight
444 KB
Volume
75
Category
Article
ISSN
0002-7820

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Hydrogen Chloride Effects on the CVD of
Hydrogen Chloride Effects on the CVD of Silicon Carbide from Methyltrichlorosilane
✍ George D. Papasouliotis; Stratis V. Sotirchos πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 645 KB

A comprehensive experimental investigation of the effects of hydrogen chloride concentration on the deposition rate and stoichiometry of SiC films produced through thermal decomposition of methyltrichlorosilane (MTS, CH 3 SiCl 3 ) is carried out in a gravimetric hot wall reactor of tubular geometry.