A comprehensive experimental investigation of the effects of hydrogen chloride concentration on the deposition rate and stoichiometry of SiC films produced through thermal decomposition of methyltrichlorosilane (MTS, CH 3 SiCl 3 ) is carried out in a gravimetric hot wall reactor of tubular geometry.
β¦ LIBER β¦
ChemInform Abstract: Hydrogen Chloride Effects on the CVD of Silicon Carbide from Methyltrichlorosilane.
β Scribed by George D. Papasouliotis; Stratis V. Sotirchos
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 28 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0931-7597
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